Now showing items 1-2 of 2
Separation of Zr and Hf via fractional crystallization of K2Zr(Hf)F6 : a theoretical and experimental study
(North-West University, 2009)
Due to the low absorption cross section for thermal neutrons of zirconium (Zr) in contrast to hafnium (Hf), Zr-metal must essentially be Hf free (<100 ppm Hf) to be suitable for use in nuclear reactors. However, Zr and Hf ...
Membrane facilitated separation of NF3 and CF4
(North-West University, 2013)
Nitrogen trifluoride (NF3) is frequently used as a source of fluorine in the electronics device manufacturing industry as a dry etchant during plasma assisted etching of silicon wafers, or during the plasma cleaning of ...